ALD-SIGRAF: Fabrication and characterization of ALD high-k dielectric layers on Silicon and Graphene | IMB CNM

Imagen

Funding agency

MICINN. Spain

Reference

TEC2011-27292-C02-02

Period

Dom, 01/01/2012 - 12:00 - Jue, 31/12/2015 - 12:00

P.I. at IMB-CNM

Campabadal Segura, Francesca