By Xavier Borrisé (ICN2 and IMB-CNM).
This presentation is organized within a series of talks about the Micro and Nanofabrication Clean Room and its areas.
About the talk
We will review the current status of the equipments and process capabilities within the Area. Then, we will present the coming changes in the near future (1-2 years); the remodelation of the labotory, which includes a technical stop of the activities for several weeks; the new acquired equipment and the foreseen equipment within PERTE and other projects.
About the speaker
Dr. Xavier Borrisé is the responsible for the Nanolithography Laboratory of the ICTS Clean-Rooms of the IMB-CNM-CSIC in collaboration with ICN2. As a responsible for this area his expertise is based on nanolithography tools in a top-down approach, being Electron Beam Lithography (EBL), NanoImprint Lithography (NIL), Focused Ion Beam Patterning (FIB) and Scanning Probe Microscopy (SPM) the main topics. These tools are driven and maintained by Dr. Borrisé and his team of two engineers under his supervision. They also train many self-service users (mainly PhD Students and Post-Doc Students) to perform their own devices. Under this expertise, he is collaborating with many different researchers in topics as nanofabrication of Nanoelectromechanical Devices using different methods (EBL, FIB), Nanoelectrodes, Nanoelectronics, Nanoparticles (in top-down aproach) and also in development of new lithography protocols.
