EBPG Plus: First choice evolutionary Technology for electron beam lithography
High-resolution lithography with Automation, Throughput and Reliability
By Christiaan Zonnevylle and Vincent Morin (Raith B.V. Best)
The EBPG Plus is an ultra-high-performance electron beam lithography system. This field-proven and highly successful series has now reached a further evolutionary level. With 100 kV write mode and high-resolution lithography below 5 nm, it covers a wide range of leading-edge applications for direct-write nanolithography, industrial R&D, and batch production in every kind of nanofabrication facility. The new integrated harmonization of throughput, stability, fidelity, and precision ensures perfect interaction between all performance parameters for optimum high-resolution lithography results.
In this Seminar, we will present the EBPG Plus which is the culmination of minor and major continuous improvements both on Hardware and Software. EBPG Plus offers a unique combination of Automation, Modularity and Performance, and it allows 24 / 7 batch mode operation with minimal operator input for consistent high output and yield,