Institute of Microelectronics of Barcelona IMB-CNM   

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Overview

 

The Silicon Nitride Platform, runs in the microfabrication facility housed in the IMB-CNM Clean Room.

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The process technical features are:

  • Wavelength range from Visible to Mid infrared
  • Three waveguide cross-sections (nitride film 300 nm height, shallow 150/300, deep 300 and mini-deep 150 nm)
  • Thermo-optic tuners (10 nm Cr + 90 nm Au, Rsq= 0,3 Ω)
  • Selective area trenching (evanescent sensors)
  • Blocks developed: waveguides, MMI couplers, Mach-Zehnder Interferometers, Sagnac interferometers, Arrayed Waveguide Gratings, Echelles Gratings, ring resonators, ...

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