This website uses its own and third-party cookies for its operation, to maintain the session and to personalize the user's experience. For more information about the cookies used consult our cookies policy

Institute of Microelectronics of Barcelona IMB-CNM   

IMB-CNM Facebookchannel IMB-CNM Linkedin channel IMB-CNM Youtube channel IMB-CNM Instagram channel IMB-CNM Pinterest channel Login to IMB-CNM Intranet

Overview

 

The Silicon Nitride Platform, runs in the microfabrication facility housed in the IMB-CNM Clean Room.

Imagen1

The process technical features are:

  • Wavelength range from Visible to Mid infrared
  • Three waveguide cross-sections (nitride film 300 nm height, shallow 150/300, deep 300 and mini-deep 150 nm)
  • Thermo-optic tuners (10 nm Cr + 90 nm Au, Rsq= 0,3 Ω)
  • Selective area trenching (evanescent sensors)
  • Blocks developed: waveguides, MMI couplers, Mach-Zehnder Interferometers, Sagnac interferometers, Arrayed Waveguide Gratings, Echelles Gratings, ring resonators, ...

Imagen2

Full Review William Hill www.wbetting.co.uk