The Silicon Nitride Platform, runs in the microfabrication facility housed in the IMB-CNM Clean Room.
The process technical features are:
- Wavelength range from Visible to Mid infrared
- Three waveguide cross-sections (nitride film 300 nm height, shallow 150/300, deep 300 and mini-deep 150 nm)
- Thermo-optic tuners (10 nm Cr + 90 nm Au, Rsq= 0,3 Ω)
- Selective area trenching (evanescent sensors)
- Blocks developed: waveguides, MMI couplers, Mach-Zehnder Interferometers, Sagnac interferometers, Arrayed Waveguide Gratings, Echelles Gratings, ring resonators, ...